Resolution enhancement techniques pdf

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Regularized level-set-based inverse lithography algorithm for IC mask synthesis. Mathematics, Computer Science. View 2 excerpts, cites methods and background. Mask optimization approaches in optical lithography based on a vector imaging model. Journal of the Optical Society of America. A, Optics, image science, and vision. Recently, a set of gradient-based optical proximity correction OPC and phase-shifting mask PSM optimization methods has been developed to solve for the inverse lithography problem under scalar … Expand.

Vectorial mask optimization methods for robust optical lithography. Computer Science, Engineering. View 1 excerpt, cites background.

Robust resolution enhancement optimization methods to process variations based on vector imaging model. Advanced Lithography. View 1 excerpt. Deep learning-based framework for comprehensive mask optimization. SVM based layout retargeting for fast and regularized inverse lithography.